Spectroscopic Ellipsometer
SE MG-1000


- Spectroscopic data measurement
 – Visible range: 350~840 nm (or 1.5~3.5 eV)
 – Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}
- Manually variable angle of incidence
 – 45°~90° with 5° step
- Single body system
 – 40 cm (W) × 30 cm (D) × 30 cm (H), 15 kg (typical)
 * UV- option requires external lamp power supply
- Easy operation
 – No set-up / No keys to control
 – Low maintenance
- User-friendly software
 – operation and analysis
- Other features
 – Sample stage with tilt & height adjustments
 sample size: (5 mm × 5 mm) ~ (200 mm × 200 mm)
 – Computer with current operating software
- Options
 – Mapping stage: manual or automatic
 – UV-option: 250~840 nm (or 1.5~5.0 eV)
SE MF-1000

-  Spectroscopic data measurement
 – Visible range: 350~840 nm (or 1.5~3.5 eV)
 – Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}
- Compact size for mobility
 – 28 cm (W)× 20 cm (D)× 6 cm (H), 6kg
- Easiest operation in the world
 – No set-up / No keys to control
 – No effort for alignment (sample faces down)
 – Maintenance-free (except lamp )
 – Calibration free (patented)*
- User-friendly software
 – operation and analysis
- Other features
 – Fixed angle of incidence: 70° ± 0.5°
 – Sample size: (8 mm × 8 mm) ~ (200 mm × 200 mm)
 – Computer with current operating software
Most ellipsometers require calibration process in each measurement to find the
 azimuths of optical elements.
 This is a lengthy and complicated process.
 SE MF-1000 is calibration free. This makes fast and easy measurement.
SE MH-1000

-  Spectroscopic Ellipsometer Head Type
 – Single head type for mapping large-area sample
 – Dimension: 25 cm (W)× 15 cm (D)× 30 cm (H)
 – Fixed Incident angle
 – Wavelength range: 350 ~850 nm
 – Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}
- Gantry type Stage for Spectroscopic Ellipsometer Head
 – Structure: gantry type (Linear motors): X-Y-Z
 – Operation: step & repeat
 – Max. speed: 0.5 m/s
 – Position accuracy: ±10 mm / full scale
 – Repeatability: ±5 mm / full scale
 – Flatness: 30± mm / full scale
 – Straightness: 15± mm / full scale
 – Pay load: 20 kg at X-slide
- Easiest operation in the world
 – Vibration Isolation Table
 – Confocal laser scanning microscope
 – Contact angle measurement
 – 4-point probe
 – etc.
SE MI-1000


-  Spectroscopic Ellipsometer Head Type
 – Visible range: 350~840 nm (or 1.5~3.5 eV)
 * UV-option: 250~840 nm (or 1.5~5.0 eV)
 – Data acquisition speed: <5 sec for full spectra of {Δ, Ψ} - Fixed Incident angle
- Assistance for In Situ System Design
 – Vacuum system
 – Heating cell, chemical cell
 – Mechanical system for interfacing IN Situ System and ellipsometer
- Option
 – Optical windows for chamber or cell
 – Mechanical shutters for preventing coating on optical windows
 – Computer with current operating software
Customized Ellipsometer
Imaging Ellipsometer

- ~0.1 nm thickness difference can be seen by IE-1000.
- Thickness distribution of thin film can be imaged.
- Thickness and optical images of semiconductor device, display, and bio samples.
- IE-1000 can show the images which can not be seen by conventional microscope.
- Defect of semiconductor and display can be seen directly.
- Easy and fast operation.
Vacuum Ellipsometer

- Spectral range down to VUV ( 145 ~ 320㎚)
- Short nitrogen purge time < 5 mins.
- Table top, small foot print.
- Manually variable angle of incidence: 45°~90°
* Application to 193 nm Immersion Lithography
* Easy & accurate measurement of thickness and refractive index for very thin
 films of semiconductor
* ARC, PR, high k , oxide, nitride, pellicle and metal.
Near IR Ellipsometer

Micro-spot Ellipsometer

Etc (Rubbins-1000)

-  Rubbing Inspection
 – 1-D (& 2-D) rubbing strength distribution can be mapped for whole LCD panel.
 – Deviation by measurement positions is less than 10% → Quick sample is possible.
 – Signal difference among different rubbing condition is distinctive.
 – Underlying important part and/or defect can also be distinctively measured.
 – In-line or off-line measurement
 – Thickness, refractive index {n, k} and uniformity measurement of any thin film
 layer including polyimide layer. (optional)
- Mapping Stage (whole glass for any generation)
 – Travel: 2280 mm × 1920 mm for 7-G
 – Max.speed: 0.5 m/s
 – Clean room quality
 – Vacuum chuck and booth
* Rubbing Inspection for LCD
 * Rubbing Strength Measurement for Process Control
 * Optical Axis Measurement in LC Alignment Layer
 * Whole Glass without Rotation, Off- & In-Line System
Spectroscopic Reflectometer
SR MR-1000

SR MR-2000

- Application
 – Antireflective coating (ARC) on textured (poly-) crystalline silicon solar cell
- Measurement
 – Thickness, Reflectivity, n&k
- Wavelength
 – 420 – 950 nm (1.3-3.0 eV) : expandable
- Accuracy (thickness measurement on specular sample)
 – 104.5 nm for 104.8 nm SiO₂on c-Si
 * Accuracy can be dependent on the quality of film
- Thickness range
 – 10 nm ~ 20 mm (depend on sample)
- Data acquisition time
 – < 1 s
- Beam spot size
 – ~ 50 mm
- Focusing of beam
 – Manual (optional auto-focus)
- Sample stage
 – Manual X-Y stage (specify sample size and travel distance)
 (optional automatic X-Y stage for mapping)

