Products

Spectroscopic Ellipsometer

SE MG-1000

  1. Spectroscopic data measurement
    – Visible range: 350~840 nm (or 1.5~3.5 eV)
    – Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}
  2. Manually variable angle of incidence
    – 45°~90° with 5° step
  3. Single body system
    – 40 cm (W) × 30 cm (D) × 30 cm (H), 15 kg (typical)
    * UV- option requires external lamp power supply
  4. Easy operation
    – No set-up / No keys to control
    – Low maintenance
  5. User-friendly software
    – operation and analysis
  6. Other features
    – Sample stage with tilt & height adjustments
    sample size: (5 mm × 5 mm) ~ (200 mm × 200 mm)
    – Computer with current operating software
  7. Options
    – Mapping stage: manual or automatic
    – UV-option: 250~840 nm  (or 1.5~5.0 eV)

SE MF-1000

  1.  Spectroscopic data measurement
    – Visible range: 350~840 nm (or 1.5~3.5 eV)
    – Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}
  2. Compact size for mobility
    – 28 cm (W)× 20 cm (D)× 6 cm (H),  6kg
  3. Easiest operation in the world
    – No set-up / No keys to control
    – No effort for alignment (sample faces down)
    – Maintenance-free (except lamp )
    – Calibration free (patented)*
  4. User-friendly software
    – operation and analysis
  5. Other features
    – Fixed angle of incidence: 70° ± 0.5°
    – Sample size: (8 mm × 8 mm) ~ (200 mm × 200 mm)
    – Computer with current operating software

Most ellipsometers require calibration process in each measurement to find the
azimuths of optical elements.
This is a lengthy and complicated process.
SE MF-1000 is calibration free. This makes fast and easy measurement.

SE MH-1000

  1.  Spectroscopic Ellipsometer Head Type
    – Single head type for mapping large-area sample
    – Dimension: 25 cm (W)× 15 cm (D)× 30 cm (H)
    – Fixed Incident angle
    – Wavelength range: 350 ~850 nm
    – Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}
  2. Gantry type Stage for Spectroscopic Ellipsometer Head
    – Structure: gantry type (Linear motors): X-Y-Z
    – Operation: step & repeat
    – Max. speed: 0.5 m/s
    – Position accuracy: ±10 mm / full scale
    – Repeatability: ±5 mm / full scale
    – Flatness: 30± mm / full scale
    – Straightness: 15± mm / full scale
    – Pay load: 20 kg at X-slide
  3. Easiest operation in the world
    – Vibration Isolation Table
    – Confocal laser scanning microscope
    – Contact angle measurement
    – 4-point probe
    – etc.

SE MI-1000

  1.  Spectroscopic Ellipsometer Head Type
    – Visible range: 350~840 nm (or 1.5~3.5 eV)
    * UV-option: 250~840 nm  (or 1.5~5.0 eV)
    – Data acquisition speed: <5 sec for full spectra of {Δ, Ψ} - Fixed Incident angle
  2. Assistance for In Situ System Design
    – Vacuum system
    – Heating cell, chemical cell
    – Mechanical system for interfacing IN Situ System and ellipsometer
  3. Option
    – Optical windows for chamber or cell
    – Mechanical shutters for preventing coating on optical windows
    – Computer with current operating software

Customized Ellipsometer

Imaging Ellipsometer

  1. ~0.1 nm thickness difference can be seen by IE-1000.
  2. Thickness distribution of thin film can be imaged.
  3. Thickness and optical images of semiconductor device, display, and bio samples.
  4. IE-1000 can show the images which can not be seen by conventional microscope.
  5. Defect of semiconductor and display can be seen directly.
  6. Easy and fast operation.

Vacuum Ellipsometer

  1. Spectral range down to VUV ( 145 ~ 320㎚)
  2. Short nitrogen purge time < 5 mins.
  3. Table top, small foot print.
  4. Manually variable angle of incidence: 45°~90°

* Application to 193 nm Immersion Lithography

* Easy & accurate measurement of thickness and refractive index for very thin
films of semiconductor

* ARC, PR, high k , oxide, nitride, pellicle and metal.

Near IR Ellipsometer

Micro-spot Ellipsometer

Etc (Rubbins-1000)

  1.  Rubbing Inspection
    – 1-D (& 2-D) rubbing strength distribution can be mapped for whole LCD panel.
    – Deviation by measurement positions is less than 10% → Quick sample is possible.
    – Signal difference among different rubbing condition is distinctive.
    – Underlying important part and/or defect can also be distinctively measured.
    – In-line or off-line measurement
    – Thickness, refractive index {n, k} and uniformity measurement of any thin film
    layer including polyimide layer. (optional)
  2. Mapping Stage (whole glass for any generation)
    – Travel: 2280 mm × 1920 mm for 7-G
    – Max.speed: 0.5 m/s
    – Clean room quality
    – Vacuum chuck and booth

* Rubbing Inspection for LCD
* Rubbing Strength Measurement for Process Control
* Optical Axis Measurement in LC Alignment Layer
* Whole Glass without Rotation, Off- & In-Line System

Spectroscopic Reflectometer

SR MR-1000

SR MR-2000

  1. Application
    – Antireflective coating (ARC) on textured (poly-) crystalline silicon solar cell
  2. Measurement
    – Thickness, Reflectivity, n&k
  3. Wavelength
    – 420 – 950 nm (1.3-3.0 eV) : expandable
  4. Accuracy (thickness measurement on specular sample)
    – 104.5 nm for 104.8 nm SiO₂on c-Si
    * Accuracy can be dependent on the quality of film
  5. Thickness range
    – 10 nm ~ 20 mm (depend on sample)
  6. Data acquisition time
    – < 1 s
  7. Beam spot size
    – ~ 50 mm
  8. Focusing of beam
    – Manual (optional auto-focus)
  9. Sample stage
    – Manual X-Y stage (specify sample size and travel distance)
    (optional automatic X-Y stage for mapping)
nanoview
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